METHOD AND APPARATUS FOR DETERMINING ELEMENT SHAPE OF SUBSTRATE, AND DETERMINATION SYSTEM FOR SUBSTRATE ELEMENT SHAPE DURING SEMICONDUCTOR MANUFACTURING PROCESS

摘要

PROBLEM TO BE SOLVED: To simply determine whether an element shape is good or not in forming a semiconductor integrated circuit device and an element such as a MEMS by semiconductor microfabrication. SOLUTION: A behavior of oscillation of an element (three-dimensional element 2a) of a predetermined shape formed on a substrate (semiconductor substrate 2) such as a crystal, glass and semiconductor is obtained in advance by semiconductor microfabrication, and it is used as determination reference for determining the element shape. A behavior of oscillation of an element formed on another substrate by the same semiconductor microfabrication as that of the mentioned substrate is compared with the determination reference, and if they coincide with each other, the shape of the element is determined to be the same as that of the reference element. COPYRIGHT: (C)2006,JPO&NCIPI