Device for drying substrate has mechanism for vertical yield of number of parallel substrate from liquid bath and fluid feeding device for arranged guiding of fluid

摘要

The drying device has a mechanism for vertical yield of number of parallel substrate (10) from a liquid bath (11) and a fluid feeding device (16,17,18) for arranged guiding of a fluid (27) with a pre-determined formation of at least a side lateral to the substrate from centric between two adjacent substrate at the liquid surface of the liquid bath. An independent claim is also included for the procedure for drying substrate.