<p>Disclosed is an antireflective film with excellent abrasion resistance and contamination resistance which contains the following components (A) and (B1). (A) A fluorine-containing polymer having an ethylenically unsaturated group. (B1) Porous silica particles having an average particle diameter of 5-50 nm which are composed of a hydrolysis product and/or hydrolysis-condensation product of a silicon compound represented by the formula (1) below and another silicon compound represented by the formula (2) below. R<SUP>1</SUP></p>
