发明名称 PATTERN FORMING SUBSTRATE, ELECTROOPTICAL DEVICE, AND MANUFACTURING METHOD OF ELECTROOPTICAL DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern forming substrate, an electrooptical device, and manufacturing method of an electrooptical device, wherein the uniformity of a shape of a pattern formed by a droplet is improved. <P>SOLUTION: A third interlayer insulating film 21 formed of a lyophilic material is formed on the side of an impacting face 20a of a second barrier wall W2 for forming a droplet receiving space S, and a through hole 21h is formed at the third interlayer insulating film 21. The inner circumferential surface (a first barrier wall W1) of the through hole 21h is formed so as to be enlarged from the side of the impacting face 20a (a bottom W1a) to an outer side in the face direction of the impacting face 20a. A lead-in groove 23 formed of the first barrier wall W1 is formed on the outer circumference of the impacting face 20a. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006179213(A) 申请公布日期 2006.07.06
申请号 JP20040368871 申请日期 2004.12.21
申请人 SEIKO EPSON CORP 发明人 SAKAI HIROBUMI
分类号 H05B33/22;G02B5/20;G09F9/00;G09F9/30;H01L27/32;H01L51/50;H05B33/02;H05B33/10 主分类号 H05B33/22
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