发明名称 POLISHING METHOD AND POLISHING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing method and a polishing device by which edge droops occurring at the outer peripheral edge part of an article to be polished can be easily and surely prevented, and also, productivity and yield in a manufacturing process of a final product can be improved compared with conventional polishing processes and a conventional device. <P>SOLUTION: When the article W to be polished is polished with a polishing cloth whose thickness is changed by contact with or separation from the outer peripheral edge part of the article W to be polished, the edge droops at the outer peripheral edge part of the article W to be polished can be controlled by properly adjusting a ratio of polishing pressure (Wa) applied when the polishing cloth 6 contacts and enters to the outer peripheral edge part of the article W to be polished to polishing pressure (Wb) applied when the polishing cloth 6 is separated from the outer peripheral edge part to a value other than 1 : 1. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006175534(A) 申请公布日期 2006.07.06
申请号 JP20040369252 申请日期 2004.12.21
申请人 NIPPON QUALITY LINKS KK;LAPMASTER SFT CORP 发明人 ISHII YASUHIRO
分类号 B24B37/005;B24B37/07;H01L21/304 主分类号 B24B37/005
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