发明名称 |
SIMULATION DEVICE AND PLASMA DISCHARGE PROCESSING DEVICE SUPPORTING SYSTEM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a simulation device and a plasma discharge processing device supporting system correctly calculating electron energy distribution or the like in a plasma of the plasma discharge processing device applying a treatment in the region of atmospheric pressure by a time-dependent Boltzmann equation or the like, and deciding a control parameter. <P>SOLUTION: The simulation device 2 is composed of an input means 3 indicating a control parameter to be corrected out of control parameters controlling the plasma discharge processing device 10 performing a plasma discharge treatment by making an electric field between electrodes periodically or continuously change under a pressure in a region of atmospheric pressure, and setting a finishing condition of a simulation; a data base means 5 in which a collision cross section of a prime reaction of gas and electron is stored; a calculation means 6 performing the simulation by using time dependent Boltzmann equation depending on the collision cross section while correcting the indicated control parameter; and a control means 7 judging whether the result of the calculation fulfills the finishing condition or not, and deciding the value of the control parameter. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006179407(A) |
申请公布日期 |
2006.07.06 |
申请号 |
JP20040373624 |
申请日期 |
2004.12.24 |
申请人 |
KONICA MINOLTA HOLDINGS INC |
发明人 |
SUETOMI HIDEKAZU;FUKAZAWA KOJI |
分类号 |
H05H1/24;C23C16/52;H01L21/3065;H01L21/31 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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