发明名称 METHOD FOR MANUFACTURING SYNTHETIC SILICA GLASS HAVING CONTROLLED OH GROUP CONCENTRATION AND SILICA GLASS BODY
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing synthetic silica glass which is suitably used for optical uses, whose OH group concentration is controlled in the optimal value and also which has excellent homogeneity and to provide a silica glass body manufactured by the method. SOLUTION: The method has a porous silica glass body forming process of forming the porous silica glass body, a dehydration process of heat-treating the porous silica glass body in a temperature range of≥600°C and≤1,200°C and in an atmosphere containing halogen, a hydration treatment process of heat-treating the silica glass body after dehydration in the temperature range of≥600°C and≤1,200°C and in an atmosphere containing steam and a transparently vitrifying process of heat-treating the silica glass body after hydration treatment in a temperature range of≥1,400°C and≤2,200°C and in an inert gas atmosphere or a reduced pressure atmosphere. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006176377(A) 申请公布日期 2006.07.06
申请号 JP20040372948 申请日期 2004.12.24
申请人 SHINETSU QUARTZ PROD CO LTD 发明人 FUJINOKI AKIRA;NISHIMURA HIROYUKI;OHASHI NOBUO;OSHIMA TAKAYUKI;FUKUI YASUSHI
分类号 C03B20/00;C03B8/04;C03C3/06 主分类号 C03B20/00
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