| 摘要 |
An exposure apparatus includes a line head in which a plurality of EL elements are aligned and a rotatable photosensitive drum, which is exposed by light from the line head. The line head includes N (where, "N" is 2 or greater) EL element columns in which the alignment direction of the EL elements is parallel to the rotational axis of the photosensitive drum. In each of the EL element columns, the area of a light-emitting pixel of the EL element which emits light is constant within a corresponding column. When the column number of the EL element columns is from 1 to N, the area S of the light-emitting pixel of the EL element in each of the columns is S<SUB>i</SUB>=S<SUB>1</SUB>x2<SUP>i-1 </SUP>(where, "i" is the column number of each of the EL element columns and a natural number from 1 to N, and "S<SUB>1</SUB>" is the area of the light-emitting pixel of the EL element of a first column). One or a plurality of EL elements selected from N EL elements within the N EL element columns perform exposure on the same unit drawing region on the photosensitive drum.
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