| 发明名称 |
Method of forming an alignment mark and manufacturing a semiconductor device using the same |
| 摘要 |
Embodiments of the present invention provide, among other things, a method of forming an alignment mark having a stepped structure without an additional process. The alignment mark may be used to prevent formation of a defect source in a semiconductor device.
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| 申请公布号 |
US2006148275(A1) |
申请公布日期 |
2006.07.06 |
| 申请号 |
US20060325208 |
申请日期 |
2006.01.03 |
| 申请人 |
HAN YOUNG-KOOG;KIM DAE-JOUNG;KIM EUN-SUNG;KIM JAE-HOON |
发明人 |
HAN YOUNG-KOOG;KIM DAE-JOUNG;KIM EUN-SUNG;KIM JAE-HOON |
| 分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
| 代理机构 |
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