发明名称 |
Method and apparatus for deposition of low dielectric constant materials |
摘要 |
A showerhead adapted for distributing gases into a process chamber and a method for forming dielectric layers on a substrate are generally provided. In one embodiment, a showerhead for distributing gases in a processing chamber includes an annular body coupled between a disk and a mounting flange. The disk has a plurality of holes formed therethrough. A lip extends from a side of the disk opposite the annular body and away from the mounting flange. The showerhead may be used for the deposition of dielectric materials on a substrate. In one embodiment, silicon nitride and silicon oxide layers are formed on the substrate without removing the substrate from a processing chamber utilizing the showerhead of the present invention.
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申请公布号 |
US2006144334(A1) |
申请公布日期 |
2006.07.06 |
申请号 |
US20060369689 |
申请日期 |
2006.03.07 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
YIM KANG S.;SEN SOOVO;SUGIARTO DIAN;LEE PETER;YIEH ELLIE |
分类号 |
C23C16/00;C23C16/44;C23C16/455;C23C16/509;H01J37/32;H01L21/20 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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