Method for fabricating gate spacer of semiconductor device,申请号KR20030102078-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Method for fabricating gate spacer of semiconductor device
摘要
申请公布号	KR100597768(B1)	申请公布日期	2006.07.06
申请号	KR20030102078	申请日期	2003.12.31
申请人		发明人
分类号	H01L21/336;H01L21/28;H01L21/3205;H01L21/4763	主分类号	H01L21/336
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Method for modifying the combining or splitting ratio of a multimode interference coupler

Image matching system using topologically equivalent correspondences

Data processing apparatus, image processing apparatus, and method therefor

Decoding a picture based on a reference picture set on an electronic device

Edge based template matching

Image processing method

Text region detection system and method

Systems and methods for removing a background of an image

MR imaging guided therapy

Automatic identification of disruptive events in imaging scans

Method for determining properties of a vessel in a medical image

Apparatus and method for detecting a vertex of an image

Image tagging user interface

Headset electronics

Wireless personal listening system and method

Mobile field level encryption of private documents

System and method for providing line power to a digital telephone

Contact center trend analysis and process altering system and method

Distinctive ring tones prompted by call urgency and context