| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming micropatterns, capable of obtaining various kinds of precise patterns of uniform thickness, by overcoming the problem of the nonuniformity of film thickness. <P>SOLUTION: The method for forming the micropatterns comprises a step of providing a substrate, a step of forming a first microfluidic layer of a photoresist material on the substrate, a step of providing a first photomask, and a step of forming the micropatterns, by exposing the first microfluidic layer by the first photomask for irradiation. The dimension of the first microfluidic layer is greater than that of the micropatterns. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
