Controlled flow of source material via droplet evaporation

摘要

A system for delivering a controlled and stable flow of vaporizable source material for use in semiconductor manufacturing applications. The system includes a droplet generator, which includes a plurality of nozzles and a pressure producing means. When sufficient pressure is applied to a liquefied or liquefiable source material, droplets of the source material are generated and ejected from the nozzles into a downstream processing tool or source/vaporization chamber. The pressure is applied either through the use of a heating element or an electromechanical transducer.