发明名称 |
Substrate processing apparatus and substrate processing method |
摘要 |
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate by the resist film processing block. The substrate is washed and dried by the washing processing unit in the washing/development processing block before the substrate is subjected to the exposure processing by the exposure device.
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申请公布号 |
US2006147202(A1) |
申请公布日期 |
2006.07.06 |
申请号 |
US20050295240 |
申请日期 |
2005.12.06 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
YASUDA SHUICHI;KANAOKA MASASHI;KANEYAMA KOJI;MIYAGI TADASHI;SHIGEMORI KAZUHITO;ASANO TORU;TORIYAMA YUKIO;TAGUCHI TAKASHI;MITSUHASHI TSUYOSHI;OKUMURA TSUYOSHI |
分类号 |
G03D5/00 |
主分类号 |
G03D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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