| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask contributing to high-quality manufacture of a thin film device. <P>SOLUTION: A transmissive region 30A of a photomask 30 is configured to include: a main transmissive region 30A1 which transmits exposure light with a phase P1 (=0°); a main transmissive region 30A2 which is disposed opposing to the main transmissive region 30A1 across a frame portion 30F and which transmits exposure light with an inverted phase 2 (=180°) with respect to the phase P1; an auxiliary transmissive region 30A3 which is disposed to surround the periphery of the main transmissive region 30A1 separated by a frame portion 30G and which transmits exposure light with the phase P2; and an auxiliary transmissive region 30A4 which is disposed surrounding the periphery of the main transmissive region 30A2 separated by the frame portion 30G and which transmits exposure light with the phase P1. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
