| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic device constituted to perform improved alignment measurement, and a method. <P>SOLUTION: The lithographic device includes an actuator for moving an object having a mark M3 having a plurality of structures 19 in rows and columns. Alignment constitution has a light source, an optical element, and a detector. The light source and the optical element generate an alignment beam having a 1st spot 24x extending in a 1st direction parallel to the rows and a 2nd spot 24y extending in a 2nd direction parallel to the rows. The optical element directs the alignment beam to the mark M3, receives alignment radiation returning from the mark M3, and sends the alignment radiation to the detector. The detector sends an alignment signal to a processor, which computes the two-dimensional position of the mark M3 based upon the alignment signal. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
