发明名称 |
POLISHING SLURRY FOR IONIC BOND MATERIAL, METHOD FOR SELECTING DISPERSING AGENT TO BE USED THEREIN, METHOD FOR SETTING COMPOUNDED CONCENTRATION OF SELECTED DISPERSING AGENT AND METHOD FOR POLISHING WITH POLISHING SLURRY |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide polishing slurry for the polishing of an ionic bond material including a fluoride crystal and giving excellent polishing properties such as the decrease of surface roughness and surface defects. <P>SOLUTION: The polishing slurry for the polishing of an ionic bond material R contains a dispersing agent forming a nonionic adsorption layer on the surface of the ionic bond material R. The nonionic adsorption layer formed on the surface of the ionic bond material R inhibits the reaction of the ionic bond material R with the polishing slurry. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
申请公布号 |
JP2006176631(A) |
申请公布日期 |
2006.07.06 |
申请号 |
JP20040370958 |
申请日期 |
2004.12.22 |
申请人 |
TOPCON CORP |
发明人 |
KUROSAWA HIROSHI |
分类号 |
C09K3/14;B24B13/00;B24B37/00 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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