| 摘要 |
A method of applying a UV resistant coating to a substrate surface includes the steps of preparing the substrate surface, and applying a liquid to the substrate surface. During application of the liquid, the liquid is allowed to cascade across the substrate surface to form a UV-resistant coating upon the surface once dry. An apparatus for storing and supplying a UV-resistant coating liquid suitable for application to a substrate surface is also described. The apparatus has a least one supply chamber connected to an outlet port. The supply chamber is adapted to receive the liquid via at least one water removal device. The chamber is also adapted to provide the liquid with a pressure greater than ambient pressure conditions as it exits the outlet port.
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