METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSIONS OF A MASK DESIGN PATTERN

摘要

The present invention provides a method and a system for measuring critical dimensions of a mask design pattern. The method includes: setting up a server comprising a measure system; establishing a connection between the server and a remote terminal through the Internet; and utilizing the remote terminal to login the server so as to transmit the mask design pattern to the server and remotely control the measure system to measure the critical dimensions of the mask design pattern.