PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY

摘要

A projection objective (120) for microlithography serves for imaging a pattern of a mask (130) arranged in its object surface into an image field (104) arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis (121) of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an image side numerical aperture NA > 0.85 and a demagnifying imaging scale where IßI < 0.05, and the planar image field (104) having a minimum image field diameter suitable for microlithography of more than 1 mm.