| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that converts a stepwise oblique line in an exposure pattern of a digital image into a straight line and forms a smooth corner. <P>SOLUTION: The exposure apparatus for forming a predetermined exposure pattern on an exposure object 7 by irradiating the exposure object 7 with a photosensitive material applied on the surface with exposure light emitted from a light source is equipped with: a micromirror array 2 which is disposed in a front side in the emiting direction of exposure light emitted from the light source 1 and which comprises micromirrors arranged in a matrix and changes inclination of each micromirror according to digital input signals corresponding to the exposure pattern; an imaging lens 3 to form an image of the exposure pattern produced by the reflected light from the micromirrors onto the object 7; an optical axis sweeping means 4 disposed on the optical path between the light source 1 and the object 7 to sweep the optical axis of the exposure light; and a control means 5 to control changes in the inclination of each micromirror and the sweeping direction or sweeping amount of the optical axis of the optical axis sweeping means 4. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
