| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which improves superposition accuracy of function patterns and suppresses increase in the cost of an exposure apparatus. <P>SOLUTION: The exposure apparatus is equipped with: an exposure optical system 3 which has a micromirror device 8 comprising a plurality of micromirrors 10 arranged in a predetermined state, with each micromirror 10 operated to tilt based on an input driving control signal to reflect exposure light from a light source 2 and to impart intensity modulation to the exposure light to emit, and which produces an image of a predetermined black matrix based on the intensity modulated exposure light and transfers the image onto a color filter substrate 7 by exposure; an imaging means 4 to image pixels of a black matrix as a reference preliminarily formed on the color filter substrate 7 at an imaging position prior to the exposure position by the exposure optical system 3 in the moving direction (A) of the color filter substrate 7; and a controlling means 6 to detect the preset reference position in the pixels imaged by the imaging means 4 and controlling to drive the micromirror array 8 based on the reference position. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
