| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce stain particles of a surface, when the surface of a reticle or a mask is exposed to the air of the optics compartment of a lithographic apparatus. <P>SOLUTION: The lithographic apparatus includes an optics compartment that contains the patterned surface of a patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to a substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection; a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment, and to create a region adjacent to the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
