| 摘要 |
PROBLEM TO BE SOLVED: To provide a raw material of a solution for organic metal chemical vapor deposition having excellent controllability of film composition and step coverage, and also to provide a composite oxide-based dielectric thin film produced by using the raw material. SOLUTION: A solution raw material is improved for metal organic chemical vapor deposition with one or more kinds of organometallic compounds dissolved in an organic solvent. In the characteristic constitution, the organic solvent is 1,3-dioxolane, or a mixed solvent obtained by mixing a first solvent comprising 1,3-dioxolane with one or more kinds of second solvents selected from a group comprising alcohol, alkane, ester, aromatic series, alkyl ether and ketone with 1,3-dioxolane. COPYRIGHT: (C)2006,JPO&NCIPI
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