发明名称 |
PRECURSOR FILM AND METHOD OF FORMING THE SAME |
摘要 |
<p>It is intended to form a precursor film of demanded Ga component ratio easily at low cost. There are provided a precursor film for use as a light absorption layer of CIS type thin-film solar cell, etc. and a method of forming the same. Using as a target a precursor film of Cu-Ga alloy layer of X wt.% Ga wherein the Ga component ratio (Ga/(Ga+Cu))is high, sputtering is performed to thereby form as a first layer a Cu-Ga layer of X wt.% Ga (film forming step A). Thereafter, using a Cu layer as a target, sputtering is performed to thereby form as a second layer a Cu layer on the first layer (film forming step B). By virtue of the sum of the first layer and the second layer, there can be realized a precursor film of, as demanded Ga component ratio, Y(X>Y) wt.% Ga. Also, there can be employed a film forming method according to simultaneous vapor deposition technique.</p> |
申请公布号 |
WO2006070800(A1) |
申请公布日期 |
2006.07.06 |
申请号 |
WO2005JP23893 |
申请日期 |
2005.12.27 |
申请人 |
SHOWA SHELL SEKIYU K.K.;KURIYAGAWA, SATORU;TANAKA, YOSHIAKI;NAGOYA, YOSHINORI |
发明人 |
KURIYAGAWA, SATORU;TANAKA, YOSHIAKI;NAGOYA, YOSHINORI |
分类号 |
H01L31/18;H01L21/363;H01L31/032 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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