Electron beam exposure system for exposure electron beam in accordance with cell merge and electron beam exposure method using the same,申请号KR20040114400-传众专利搜索

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发明名称	Electron beam exposure system for exposure electron beam in accordance with cell merge and electron beam exposure method using the same
摘要
申请公布号	KR100596039(B1)	申请公布日期	2006.07.05
申请号	KR20040114400	申请日期	2004.12.28
申请人		发明人
分类号	H01L21/027	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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