| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a fluorine-doped quartz glass having a high transmittance in a wavelength of 157 nm suitable for a F2 laser lithography. SOLUTION: The manufacturing method comprises the steps wherein a porous quartz glass is formed by flame-hydrolysing the base material of the quartz glass; the porous quartz glass is heated in an atmosphere of an inert gas, then fluorine-doped in the atmosphere containing SiF4 of 1-20% at 1000-1200 deg.C; the doped quartz glass is cleared at an elevated temperature in the above atmosphere; and the cleared glass is hydrogen-doped in the atmosphere containing a gaseous hydrogen at 200-300 deg.C. |
