METHOD FOR MANUFACTURING ISOLATION LAYER IN SEMICONDUCTOR DEVICE,申请号KR20040113551-传众专利搜索

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发明名称	METHOD FOR MANUFACTURING ISOLATION LAYER IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20060075007(A)	申请公布日期	2006.07.04
申请号	KR20040113551	申请日期	2004.12.28
申请人	HYNIX SEMICONDUCTOR INC.	发明人	CHUNG, CHAI O
分类号	H01L21/76;H01L21/205;H01L21/31	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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