Method of simulating patterns, computer program therefor, medium storing the computer program and pattern-simulating apparatus

摘要

A pattern simulation method includes reticle data and exposure data. The reticle data contain reticle patterns for regions into which an entire pattern is divided. The exposure data are composed of positioning data for reticle patterns to be exposed on a substrate. A substrate pattern is formed on the substrate in accordance with the reticle data and the exposure data. OR logic operations are executed for patterns corresponding to regions of the substrate pattern exposed on the substrate to simulate exposure patterns on the substrate. Design defects of the reticle data or the exposure data can be easily found by checking of simulation patterns corresponding to regions which are not exposed on the substrate when the substrate pattern is formed on the substrate in accordance with the reticle data and the exposure data.