| 摘要 |
In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression: <?in-line-formulae description="In-line Formulae" end="lead"?>tauI<SUP>-2</SUP>L<SUP>-1.7</SUP>>=0.02 (ns.mJ<SUP>-2.</SUP>cm<SUP>2.3</SUP>.pulse<SUP>2</SUP>)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ.cm<SUP>-2</SUP>.pulse<SUP>-1</SUP>) per pulse, and tau is the pulse width (unit: ns).
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