发明名称 |
Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
摘要 |
A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.
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申请公布号 |
US7070889(B2) |
申请公布日期 |
2006.07.04 |
申请号 |
US20040989314 |
申请日期 |
2004.11.17 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
OHASHI KATSUKI;INOUE HIROMU;ONO AKIRA;IKEDA HIROYUKI |
分类号 |
G03F9/00;G01N21/956;G03F1/00;G03F7/20 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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