发明名称 Method of defect review
摘要 A method of defect review. First, a wafer with a plurality of defects is provided. A defect inspection is performed to detect the defects. An automatic defect classification is then performed to divide the defects into different defect types according to a predetermined database. A defect review is performed to review different defect types of defects which are sampled in different weights according to yield killing ratios of each defect types.
申请公布号 US7071011(B2) 申请公布日期 2006.07.04
申请号 US20040707824 申请日期 2004.01.15
申请人 POWERCHIP SEMICONDUCTOR CORP. 发明人 LIN LONG-HUI
分类号 H01L21/00;G01N37/00;G01R31/26;G06F19/00;H01L21/66 主分类号 H01L21/00
代理机构 代理人
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