发明名称 |
Functional film, method of fabricating the same, liquid crystal display device using functional film, and method of fabricating the same |
摘要 |
The present invention is characterized in that an underlying layer solution containing a hydrolyzable compound represented by <?in-line-formulae description="In-line Formulae" end="lead"?>X-(SiOX<SUB>2</SUB>)<SUB>n</SUB>-SiX<SUB>3</SUB><?in-line-formulae description="In-line Formulae" end="tail"?> (where X is at least one functional group selected from the group consisting of a halogen, an alkoxy group, and an isocyanate group and n is an integer equal to or more than 0) is brought into contact with a surface of a base material, the underlying layer solution is dried at a temperature less than 300° C. to form an underlying layer, a solution containing a silane-based compound is brought into contact with a surface of the underlying layer to cause chemical adsorption of the molecules of the silane-based compound to the surface of the underlying layer, and the base material is sintered at a temperature of 300° C. or more. This improves the water repellency, resistance, and heat resistance of a functional film composed of the silane-based compound, which is for modifying the properties of the surface of the base material.
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申请公布号 |
US7070839(B2) |
申请公布日期 |
2006.07.04 |
申请号 |
US20030464518 |
申请日期 |
2003.06.19 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
NOMURA TAKAIKI;OGAWA KAZUFUMI;OTAKE TADASHI;TAKEBE TAKAKO |
分类号 |
C09K19/38;B32B9/04;B32B25/20;C03C17/42;C08J7/04;G02F1/1337 |
主分类号 |
C09K19/38 |
代理机构 |
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地址 |
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