发明名称 Functional film, method of fabricating the same, liquid crystal display device using functional film, and method of fabricating the same
摘要 The present invention is characterized in that an underlying layer solution containing a hydrolyzable compound represented by <?in-line-formulae description="In-line Formulae" end="lead"?>X-(SiOX<SUB>2</SUB>)<SUB>n</SUB>-SiX<SUB>3</SUB><?in-line-formulae description="In-line Formulae" end="tail"?> (where X is at least one functional group selected from the group consisting of a halogen, an alkoxy group, and an isocyanate group and n is an integer equal to or more than 0) is brought into contact with a surface of a base material, the underlying layer solution is dried at a temperature less than 300° C. to form an underlying layer, a solution containing a silane-based compound is brought into contact with a surface of the underlying layer to cause chemical adsorption of the molecules of the silane-based compound to the surface of the underlying layer, and the base material is sintered at a temperature of 300° C. or more. This improves the water repellency, resistance, and heat resistance of a functional film composed of the silane-based compound, which is for modifying the properties of the surface of the base material.
申请公布号 US7070839(B2) 申请公布日期 2006.07.04
申请号 US20030464518 申请日期 2003.06.19
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 NOMURA TAKAIKI;OGAWA KAZUFUMI;OTAKE TADASHI;TAKEBE TAKAKO
分类号 C09K19/38;B32B9/04;B32B25/20;C03C17/42;C08J7/04;G02F1/1337 主分类号 C09K19/38
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