发明名称 |
PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS |
摘要 |
THE PRESENT INVENTION RELATES TO A RADIATION SENSITIVE PHOTORESIST COMPOSITION COMPRISING A PHOTOACID INITIATOR AND A POLYCYCLIC POLYMER COMPRISING REPEATING UNITS THAT CONTAIN PENDANT ACID LABILE GROUPS. UPON EXPOSURE TO AN IMAGING RADIATION SOURCE THE PHOTOACID INITIATOR GENERATES AN ACID WHICH CLEAVES THE PENDANT ACID LABILE GROUPS EFFECTING A POLARITY CHANGE IN THE POLYMER. THE POLYMER IS RENDERED SOLUBLE IN AN AQUEOUS BASE IN THE AREAS EXPOSED TO THE IMAGING SOURCE.(FIGURE 1)
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申请公布号 |
MY123980(A) |
申请公布日期 |
2006.06.30 |
申请号 |
MYPI9804156 |
申请日期 |
1998.09.10 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;SUMITOMO BAKELITE CO., LTD. |
发明人 |
BRIAN L. GOODALL;ROBERT S. SHICK;LARRY F. RHODES;ROBERT DAVID ALLEN;RICHARD ANTHONY DIPIETRO;THOMAS WALLOW;JAYARAMAN, SAIKUMAR |
分类号 |
G03F7/004;C08F2/46;C08F32/00;C08G61/08;G03C1/72;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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