| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid state imaging apparatus and a mask manufacturing method, wherein a light collection rate is improved when an incident angle characteristic with respect to an image height is not in proportion each other. SOLUTION: The solid state imaging apparatus includes a light receiving region composed of a light reception part 2 disposed two-dimensionally, and a microlens layer composed of micro lenses arranged at positions shifted from a location just above a photoelectric conversion element toward the optical center of the light receiving region. The microlens layer 6 includes a first microlens group composed of a part of the microlenses, and a second microlens group composed of the other part of the microlenses existent at a position more separated away from the optical center than the first microlens group. The shift of the microlenses belonging to the second microlens group is smaller than that of the microlenses belonging to the second microlens group. COPYRIGHT: (C)2006,JPO&NCIPI
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