发明名称 METHOD FOR GROWING OPTIONALLY COATED BETA-SIC OR ALPHA-SI3N4 NANOWIRES
摘要 <p>The invention concerns a method for growing at a given growth temperature, cubic silicon carbide (Beta-SiC), trigonal silicon nitride (Alpha-Si3N4), or mixed Beta-Sic and Alpha-Si3N4 nanowires. The invention is characterized in that the growth is carried out, in the absence of catalyst, at the growth temperature T, on a graphite growth support, by reacting a carbon derivative in gaseous phase and a silicon derivative in gaseous phase, and optionally a nitrogen derivative in gaseous phase.</p>
申请公布号 WO2006067308(A1) 申请公布日期 2006.06.29
申请号 WO2005FR03145 申请日期 2005.12.15
申请人 UNIVERSITE CLAUDE BERNARD LYON I;R.S.) CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.;BECHELANY, MIKHAEL;CORNU, DAVID;MIELE, PHILIPPE 发明人 BECHELANY, MIKHAEL;CORNU, DAVID;MIELE, PHILIPPE
分类号 C30B29/62;C30B29/36;C30B29/38 主分类号 C30B29/62
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