| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition and a photosensitive film that uses the same which have small surface tackiness, proper laminating and handling properties, and superior storage stability, and which exhibit, after development superior surface hardness and in particular, exhibit high heat resistance, reduction of the development time, and so forth, and to provide a high-definition permanent pattern and a method for manufacturing the same. <P>SOLUTION: There are provided the photosensitive composition that includes at least a copolymer obtained by the reaction of anhydride groups of a maleic anhydride copolymer with one or more kinds of 0.1-1.2 equivalent with respect to primary amine compounds, a compound in which an ethylenic unsaturated double bond group and an acid group are introduced into an epoxy compound, a monomer having at least one kind of polymerizable unsaturated bond, and a photopolymerization initiator; the photosensitive film that uses the same; and the permanent pattern and its manufacturing method. In particular, in a preferred embodiment and so forth, the glass transition temperature (Tg) of the cured film of the composition is ≥75°C, and the mixing rate of the compound, to which the ethylenic unsaturated double-bonded group and the acid group are introduced into the epoxy compound, is 5-50 mass%. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
