METHOD OF MAKING INACTIVATED SEMICONDUCTOR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method of inactivating a semiconductor substrate containing semiconductor materials other than silicon in connection with a further IC treatment.

SOLUTION: The present method of making an inactivated semiconductor substrate, comprises the steps of: providing a front surface of a mono-crystalline substrate containing the semiconductor materials other than silicon, or consisting of the semiconductor materials other than silicon; and forming a silicon layer on a substrate front surface so that the silicon layer may be substantially lattice matched to a corresponding part of the substrate front surface.

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