| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an irregular flaw inspection method capable of efficiently inspect an irregular flaw with high precision. <P>SOLUTION: In the irregular flaw inspection method for inspecting the irregular flaw produced in the repeating pattern of a photomask 50 having the repeating pattern wherein a large number of unit patterns are arranged regularly, a region having the repeating pattern becoming the inspection target of the irregular flaw is designated as an inspection area from the whole image of the photomask taken by the imaging camera 21 of a pattern data acquiring device 20 and the pattern data of the repeating pattern is acquired from the image, which is taken by a microscope 22, of the repeating pattern in the inspection area. The inspection condition of the irregular flaw due to an irregular flaw inspection device 10 is determined on the basis of the pattern data and the inspection of the irregular flaw is performed on the basis of the inspection condition by the irregular flaw inspection device. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
