发明名称 Semiconductor device and method of manufacturing the same
摘要 This invention is intended to provide an HBT capable of achieving, if the HBT is a collector-up HBT, the constriction of the emitter layer disposed directly under an external base layer, and reduction in base-emitter junction capacity, or if the HBT is an emitter-up HBT, reduction in base-collector junction capacity. For the collector-up HBT, window structures around the sidewalls of a collector are used to etch either the emitter layer disposed directly under the external base layer, or an emitter contact layer For the emitter-up HBT, window structures around the sidewalls of an emitter are used to etch either the collector layer disposed directly under the external base layer, or a collector contact layer. In both HBTs, the external base layer is supported by a columnar structure to ensure mechanical strength.
申请公布号 US2006138458(A1) 申请公布日期 2006.06.29
申请号 US20050316908 申请日期 2005.12.27
申请人 RENESAS TECHNOLOGY CORP. 发明人 TANAKA KENICHI;TANOUE TOMONORI;MATSUMOTO HIDETOSHI;OHTA HIROSHI;MOCHIZUKI KAZUHIRO;UCHIYAMA HIROYUKI
分类号 H01L31/109 主分类号 H01L31/109
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