| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor substrate cleaning liquid that does not cause any change with lapse of time in a region from a neutral region to a basic region and is high in oxidizing ability. SOLUTION: The semiconductor substrate cleaning liquid contains quaternary ammonium salt, such as the perchloric acid and/or periodic acid, tetra-alkyl ammonium hydroxy, trialkyl-hydroxy alkyl ammonium hydroxy, etc., and water. In addition, the cleaning liquid can contain a metal deposition preventing agent and chelating agent. It is preferable to adjust the content of the perchloric acid and/or periodic acid to 0.001-10 wt.% of the total weight of the cleaning liquid and the adding amount of the quaternary ammonium salt to 0.001-10 wt.% of the total weight of the cleaning liquid. The semiconductor substrate cleaning liquid is a neutral to basic liquid and it is preferable to maintain the pH of the liquid at 6-12, especially, at 6-9. COPYRIGHT: (C)2006,JPO&NCIPI
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