发明名称 FOCUSED ION BEAM PROCESSING DEVICE AND SAMPLE BASE USED FOR IT
摘要 PROBLEM TO BE SOLVED: To enable to manufacture a sample having a high reliability at EDX (energy dispersion type X-ray dispersion spectrometer) analysis, and capable of standing a high-magnification observation, for a sample manufacturing device enabling analysis and observation of a micro region by extracting a micro sample from an original sample with the use of an FIB (focused ion beams). SOLUTION: The focused ion beam processing device includes a focused ion beam irradiation means, and a sample base for fixing a sample for irradiating focused ion beams from the focused ion beam irradiation means. At least a surface of the sample base is made of carbon. Further, at least a surface of the sample base for fixing the sample irradiated with the focused ion beams consists of at least a kind selected from carbon, conductive polymer material, carbon fiber, glassy carbon, polymer material and carbon slim rods. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006172958(A) 申请公布日期 2006.06.29
申请号 JP20040365262 申请日期 2004.12.17
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 UMEMURA KAORU;ONISHI TAKESHI;KONNO MITSURU
分类号 H01J37/20;G01N1/28;G01N1/32;H01J37/317 主分类号 H01J37/20
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