发明名称 Gasundurchlässiger Schichtstoff und Verfahren zu seiner Herstellung
摘要 <p>Provided is a gas barrier laminated film having no fear of deterioration in transparency and excellent in transparency and gas barrier property at a high humidity as well as a process for producing same. The present invention is featured by a gas barrier laminated film wherein a gas barrier layer (B) has been formed on at least one surface of a film substrate (A), the gas barrier layer (B) being comprised of a composition (b3) of an ethylene-vinyl alcohol copolymer (b1) having an ethylene content of 1 SIMILAR 19 mol % and (meth)acrylic acid polymer (b2). In case the film substrate is coated on at least one surface thereof with a vapor deposition layer of an inorganic oxide or the OPP film is coated on at least one surface thereof with the layer of the modified propylene polymer, the gas barrier laminated film is obtained which is more enhanced in adhesion power to the film substrate.</p>
申请公布号 DE602004000101(T2) 申请公布日期 2006.06.29
申请号 DE20046000101T 申请日期 2004.03.29
申请人 TOHCELLO CO., LTD. 发明人 NAKAMURA, OSAMU;TODA, KINICHI
分类号 B32B27/08;B32B27/36;B32B27/30;B32B27/32;C08J7/04 主分类号 B32B27/08
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