| 摘要 |
PROBLEM TO BE SOLVED: To suppress fluctuation in amount of floating of substrate in the substrate supporting apparatus to support floating of substrate using gas pressure. SOLUTION: The stage of the substrate supporting apparatus is arranged in the sequence of inlet fine floating region 28, to front end rough floating region 24, to center fine floating region 22, to rear end rough floating region 26, and to exit fine floating region 30. A plurality of porous disks 34 are arranged in each of fine floating regions 22, 28, 30, and the compressed gas controlled precisely for floating the substrate is supplied to these disks 34. When length of each rough floating region is defined as A, length of each fine floating region as B, and length of substrate as L, (A+B) is set almost equal to L. When the total number of porous disks 34 of each fine floating region is defined as N and the total number of porous disks 34 to receive the floating force from each fine floating region of the substrate as n, each length is determined to obtain the result that n/N is constant in the total period where the substrate moves on the stage. COPYRIGHT: (C)2006,JPO&NCIPI |
