发明名称 INTERFEROMETRIC MEASURING METHOD AND INTERFEROMETRIC MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an interferometric measuring method and an interferometric measuring apparatus, which can precisely measure a surface profile by eliminating error components of an reference surface and a surface to be measured caused by temperature gradients in a measurement space. SOLUTION: The method comprises steps of; measuring a plurality of interference measurement data sets while varying orientations of the reference surface and the surface to be measured in their rotational direction about the measurement light axis; computing the error components by summing and averaging the plurality of interference measurement data sets; and subtracting the error components from the interference measurement data sets. Accordingly, the error components of the reference surface and the surface to be measured caused by the temperature gradients in the measurement space can be eliminated by carrying out the above method, and the surface profile is measured precisely. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006170777(A) 申请公布日期 2006.06.29
申请号 JP20040363032 申请日期 2004.12.15
申请人 CANON INC 发明人 FURUSAWA TOSHINORI
分类号 G01B9/02;G01B11/24 主分类号 G01B9/02
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