发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor substrate of a first conduction type is provided for serving as a common drain to a plurality of power MISFET cells. A middle semiconductor layer is formed on the semiconductor substrate and has a lower impurity concentration than that of the semiconductor substrate. Pillar regions are formed on the middle semiconductor layer and include semiconductor regions of the first conduction type having a lower impurity concentration than that of the middle semiconductor layer.
申请公布号 US2006138536(A1) 申请公布日期 2006.06.29
申请号 US20050151410 申请日期 2005.06.14
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KOUZUKI SHIGEO;OKUMURA HIDEKI;SAITO WATARU;IZUMISAWA MASARU;SHIOMI MASAHIKO;KOBAYASHI HITOSHI;TOKANO KENICHI;YANAGISAWA SATOSHI;YOSHIOKA HIRONORI;KIMURA MANABU
分类号 H01L29/76 主分类号 H01L29/76
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