发明名称 METHOD FOR MANUFACTURING PIEZOELECTRIC ELEMENT AND METHOD FOR MANUFACTURING LIQUID INJECTION HEAD
摘要 <P>PROBLEM TO BE SOLVED: To remove particles in a wafer surface and reduce the occurrence of foreign substances in the wafer surface by scrub cleaning, and thereby to reduce the occurrence of defects when manufacturing a piezoelectric element. <P>SOLUTION: A method for manufacturing the piezoelectric element 300 comprises forming a piezoelectric layer 70 comprised of ferroelectric layers 71 on a lower electrode layer 60 and forming an upper electrode film 80 on the piezoelectric layer 70. The piezoelectric layer 70 is formed by performing scrub cleaning after the deposition of the lower electrode film 60 until the upper electrode film 80 is formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006173499(A) 申请公布日期 2006.06.29
申请号 JP20040366649 申请日期 2004.12.17
申请人 SEIKO EPSON CORP 发明人 KAZAMA HIRONOBU;KURIKI AKIRA;MURAI MASAMI
分类号 B41J2/16;B41J2/14;B41J2/145;H01L41/09;H01L41/187;H01L41/22;H01L41/314 主分类号 B41J2/16
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