| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography equipment which has a short quiescent time and a small area of a portion exposed to vacuum. <P>SOLUTION: Lithography equipment which operates in a vacuum is disclosed. The lithography equipment comprises a vacuum housing for providing a vacuum environment for a supporting portion or a substrate table structured such that a patterning apparatus is supported, a projection system, or its arbitrary combination. In the vacuum housing, a plurality of transporting circuits for transporting fluids and/or electrical signals for use in the first process mode of a lithography process are housed. At least one of the plurality of transporting circuits is for transporting energy toward the interior of the vacuum housing in order to guide the gas evolution of the vacuum housing for use in the lithography equipment in the second process mode for allowing the lithography equipment to be in a vacuum operation state. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
