| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion exposure apparatus which performs exposure with a liquid filling up a space between a substrate and an optical system which excels in safety and can performs exposure with accuracy. <P>SOLUTION: The exposure apparatus 1 comprises a holding means 2 for holding the substrate 5, the optical system 3 which irradiates exposure light for projecting a prescribed pattern onto the substrate 5 held by the holding means 2, and a liquid supplying means 4 which fills up a space 6 between the substrate 5 held by the holding means 2 and the optical system 3 with a liquid 7. The liquid 7 filling up the space 6 between the substrate 5 held by the holding means 2 and the optical system 3 is grounded. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
