发明名称 SCANNING EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To correct curvature of the field without providing an fθcorrection optical system in a scanning exposure apparatus. SOLUTION: A laser beam 30a formed with a laser light source 30 with a predetermined luminous flux diameter is reflected with a variable curvature mirror 20 and deflected with a polygon scanner 5, and an exposure face 6 is scanned. The curvature of the reflection face 21a of the variable curvature mirror 20 is varied with a variable curvature mirror control means 51 according to the scanning position with the laser beam 30a, and the image curvature on the exposure face 6 is corrected. Further, the exposing position and the exposing quantity of the laser beam 30a in a main scanning direction on the exposure face 6 are corrected with an exposure control means 8. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006171319(A) 申请公布日期 2006.06.29
申请号 JP20040363156 申请日期 2004.12.15
申请人 SAMSUNG YOKOHAMA RESEARCH INSTITUTE CO LTD 发明人 KIKUCHI SUSUMU
分类号 G02B26/10;B41J2/44;G02B5/10;H04N1/036;H04N1/113;H04N1/29 主分类号 G02B26/10
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